Korean outlet The Bell reported on 26 that Samsung Electronics is re-accelerating R&D on the 1.4nm (SF1.4) process. The node had been slated for volume production in 2027 but was deferred to 2029 after a foundry business reprioritization. Samsung has shared its SF1.4 process plan with major equipment suppliers, including Applied Materials and Lam Research, aiming to speed joint development and produce customized variants of standard tools for the node. Samsung has taken delivery of an ASML High-

2026-06-30

Korean outlet The Bell reported on 26 that Samsung Electronics is re-accelerating R&D on the 1.4nm (SF1.4) process. The node had been slated for volume production in 2027 but was deferred to 2029 after a foundry business reprioritization. Samsung has shared its SF1.4 process plan with major equipment suppliers, including Applied Materials and Lam Research, aiming to speed joint development and produce customized variants of standard tools for the node. Samsung has taken delivery of an ASML High-NA EUV lithography system and deployed it at its NRD-K semiconductor R&D complex; High-NA EUV is expected to be used first on the SF1.4 node.